Ena, Japan

Koji Akiyama

This inventor holds 1 USPTO granted patent. Top assignees: Tokai Shinei Electronics Inidustry Co., Ltd, Yamatoya Company Limited, Other. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koji Akiyama. Retrieved from https://idiyas.com/inventor/koji-akiyama-ul3xwult

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 12.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Koji Akiyama: Innovator in Substrate Manufacturing

Introduction

Koji Akiyama is a notable inventor based in Ena, Japan. He has made significant contributions to the field of substrate manufacturing, particularly through his innovative patent.

Latest Patents

Akiyama holds a patent for a "Method of manufacturing substrate and substrate and mask film." This method involves applying solder resist ink, which contains a mixing resin of epoxy-based resin and acrylic-based resin, on at least one surface of a substrate body to create a solder resist layer. The process includes irradiating a predetermined portion of the solder resist layer with ultraviolet rays and controlling the amount of irradiation to achieve a specific transmissivity that allows light to pass through.

Career Highlights

Throughout his career, Akiyama has worked with Tokai Shinei Electronics Industry Co., Ltd. His work has been instrumental in advancing substrate manufacturing techniques.

Collaborations

Akiyama has collaborated with notable individuals in his field, including Kazunori Tsuge and Yoshihito Tanaka.

Conclusion

Koji Akiyama's innovative approach to substrate manufacturing has led to advancements that benefit the industry. His contributions through patents and collaborations highlight his role as a key inventor in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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