Tokyo, Japan

Koichiro Takeuchi

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi High-Tech Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koichiro Takeuchi. Retrieved from https://idiyas.com/inventor/koichiro-takeuchi-gi6d819d

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Koichiro Takeuchi and Electronic Cleaning Technology.

Introduction

Koichiro Takeuchi is an inventor associated with Hitachi High-Tech Corporation in Tokyo, Japan. His patent work addresses contamination inside charged-particle equipment, where electron irradiation can cause carbon deposits to form on chamber components and sample surfaces.

Latest Patents

The provided information lists one patent for Takeuchi: “Electronic cleaning device.” The invention describes a sample chamber connected to a lens barrel containing a charged-particle source. An electron source is positioned inside the chamber, with a shield plate in front of it. Primary electrons from the source strike the shield plate, producing secondary electrons that help clean the chamber’s interior. This approach is intended to reduce contamination caused by hydrocarbon gases.

Career Highlights

Takeuchi’s listed patent reflects work on maintaining cleaner operating conditions in charged-particle systems. The record identifies Hitachi High-Tech Corporation as his company and reports 1 patent.

Collaborations

The provided information names Yuto Kubonaka and Masaomi Ohno as Takeuchi’s coworkers. Their specific roles in the patent or related work are not stated.

Conclusion

Koichiro Takeuchi’s listed invention applies secondary electrons to chamber cleaning, addressing contamination in charged-particle equipment through a design associated with Hitachi High-Tech Corporation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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