Koichiro Ohira

Title: Koichiro Ohira: Innovator in Semiconductor Manufacturing

Introduction

Koichiro Ohira is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative methods have paved the way for advancements in the industry.

Latest Patents

Ohira holds a patent for a method of making a semiconductor device that features a planarized insulating layer. This method involves several steps, including forming a wiring pattern through dry etching on a semiconductor substrate. The process utilizes a resist pattern as a mask and includes immersing the wiring pattern in an amine-containing liquid to eliminate deposition residues. Following this, the wiring pattern is processed with a fluid that does not contain amine, which is capable of removing additional residues. A conformal insulating layer is then formed on the processed wiring pattern, culminating in the creation of an insulating layer with a planarizing function through chemical vapor deposition (CVD). This method is particularly suitable for multi-layer wiring and ensures the formation of an interlayer insulating film with a satisfactory planarizing function. Ohira has 1 patent to his name.

Career Highlights

Koichiro Ohira is associated with Fujitsu Corporation, where he has contributed to various projects in semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor devices.

Collaborations

Ohira has collaborated with notable colleagues, including Kazutoshi Izumi and Masahiko Doki. Their combined expertise has further advanced the field of semiconductor manufacturing.

Conclusion

Koichiro Ohira's innovative methods in semiconductor device manufacturing highlight his significant role in the industry. His contributions continue to influence advancements in technology and manufacturing processes.