This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignees: Nikon Corporation, Kumamoto University. Active years: 2013-2021.
Location History:
- Tokyo, JP (2015)
- Fuchu, JP (2013 - 2021)
Company Filing History:


Years Active: 2013-2021
Title: Koichiro Iwahori: Innovator in Nanotechnology
Introduction
Koichiro Iwahori is a prominent inventor based in Fuchu, Japan. He has made significant contributions to the field of nanotechnology, holding a total of 4 patents. His work focuses on the development of advanced materials and manufacturing methods that have potential applications in various industries.
Latest Patents
Iwahori's latest patents include innovative technologies such as nanoparticle assemblies and methods for producing these assemblies. One of his notable inventions involves a nanoparticle assembly that includes nanoparticles with an average primary particle size of 60 nm or less, resulting in an assembly diameter of more than 500 nm and up to 5 µm. Additionally, he has developed a method for manufacturing compound films, which involves controlling the amount of nitrogen in the film. This method includes forming films that are laminated on a substrate within a film-forming chamber, utilizing techniques such as Filtered Arc Ion Plating and sputtering.
Career Highlights
Throughout his career, Koichiro Iwahori has worked with esteemed organizations, including Nikon Corporation and Kumamoto University. His experience in these institutions has allowed him to refine his expertise in material science and nanotechnology.
Collaborations
Iwahori has collaborated with notable colleagues in his field, including Yasutaka Nishi and Tsukasa Kishiume. These partnerships have contributed to the advancement of his research and innovations.
Conclusion
Koichiro Iwahori stands out as a key figure in the realm of nanotechnology, with a focus on nanoparticle assemblies and compound film manufacturing. His contributions continue to influence the development of advanced materials and technologies.