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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9719164 B1

PDFFull Text
Date of Patent:
Aug. 01, 2017

Filed:

Oct. 29, 2015

Method of manufacturing compound film

Applicant:

Nikon Corporation, Tokyo, JP;

Inventors:

Tsukasa Kishiume, Kawasaki, JP;

Koichiro Iwahori, Fuchu, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:

Archene Turner

Int. Cl.
CPC ...
C23C 14/06 (2006.01); H01L 21/02 (2006.01); C23C 14/08 (2006.01); C23C 14/32 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/0676 (2013.01); C23C 14/0641 (2013.01); C23C 14/08 (2013.01); C23C 14/083 (2013.01); C23C 14/325 (2013.01); C23C 14/34 (2013.01); H01L 21/02381 (2013.01); H01L 21/02422 (2013.01); H01L 21/02483 (2013.01); H01L 21/02491 (2013.01); H01L 21/02507 (2013.01); H01L 21/02565 (2013.01); H01L 21/02631 (2013.01);
Abstract

An amount of nitrogen in a compound film is controlled. A method of manufacturing compound film comprising forming films laminated on a substrate placed at a film forming chamber is provided. According to the method of manufacturing compound film, a first compound layer including one or more elements selected from metal elements and semimetal elements and oxygen element and a second compound layer including one or more elements and nitrogen element are laminated alternately. The first compound layer is formed by a Filtered Arc Ion Plating method and the second compound layer is formed by a sputtering method.

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Kishiume, Tsukasa. (2017). Method of manufacturing compound film (U.S. Patent No. 9719164). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9719164

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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