Koichiro Hashimoto

Title: Koichiro Hashimoto: Innovator in Semiconductor Processing

Introduction

Koichiro Hashimoto is a notable inventor based in Chigasaki, Japan. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patents. With a total of 2 patents, Hashimoto's work has had a considerable impact on the industry.

Latest Patents

Hashimoto's latest patents include a negative-working photosensitive composition suitable for use as a photoresist material in photolithographic processing. This composition comprises a condensation product of a hydroxy-substituted diphenylamine compound and an azide compound that absorbs UV or far UV light. The resulting photoresist layer exhibits high resistance to heat and gas plasma, which is crucial for semiconductor processing. Additionally, he has developed an aqueous alkaline developer solution for positive-type photoresists. This solution contains tetraalkyl ammonium hydroxide and trialkyl hydroxyalkyl ammonium hydroxide, which together enhance the development performance while minimizing temperature dependency.

Career Highlights

Hashimoto is associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in the semiconductor industry. His work has been instrumental in improving the efficiency and effectiveness of photoresist materials used in semiconductor manufacturing.

Collaborations

Throughout his career, Hashimoto has collaborated with notable colleagues, including Hisashi Nakane and Naoki Ito. These collaborations have further enriched his contributions to the field.

Conclusion

Koichiro Hashimoto's innovative patents and contributions to semiconductor processing highlight his importance as an inventor in the industry. His work continues to influence advancements in technology and manufacturing processes.