Kyoto, Japan

Koichi Kudo


Average Co-Inventor Count = 1.4

ph-index = 5

Forward Citations = 47(Granted Patents)


Company Filing History:


Years Active: 1994-1997

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7 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Koichi Kudo

Introduction

Koichi Kudo is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of photodiode arrays. With a total of seven patents to his name, Kudo's work has had a substantial impact on the industry.

Latest Patents

Kudo's latest patents include innovative designs for photodiode arrays and methods for their manufacturing. One of his notable inventions describes a photodiode array that consists of an insulating film, a semiconductor layer of a first conductivity type, and both positive and negative electrodes formed on the semiconductor layer. This design features a series of pn junctions created by diffusion layers of different conductivity types, which enhance the efficiency and reduce the size of the chip. Another patent outlines a similar photodiode array that includes a substrate, an insulating film, and impurity-diffusion layers that define pn junctions arranged laterally. This arrangement increases the area of pn junctions per unit area of the substrate, contributing to reduced production costs.

Career Highlights

Kudo has built a successful career at Rohm Co., Ltd., where he has been instrumental in advancing semiconductor technologies. His innovative approaches have not only led to the development of new products but have also improved existing technologies in the field.

Collaborations

Throughout his career, Kudo has collaborated with notable colleagues, including Yasuo Aki and Hiroshi Kadonishi. These partnerships have fostered a creative environment that has led to groundbreaking advancements in semiconductor technology.

Conclusion

Koichi Kudo's contributions to the field of photodiode arrays exemplify the spirit of innovation and collaboration in technology. His patents reflect a commitment to enhancing efficiency and reducing costs in semiconductor manufacturing.

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