Company Filing History:
Years Active: 2001-2009
Title: Koichi Asaka: Innovator in Heat Processing Technology
Introduction
Koichi Asaka is a prominent inventor based in Kumamoto, Japan. He has made significant contributions to the field of heat processing technology, holding a total of 3 patents. His innovative methods have advanced the way substrates are treated in various applications.
Latest Patents
Asaka's latest patents focus on methods and apparatuses for heat processing substrates. One of his notable inventions is a method that involves a three-step process for baking a substrate with a coating film. The first step increases the substrate's temperature from a low to an intermediate level, which is lower than the reaction temperature. The second step maintains this intermediate temperature for a predetermined period, ensuring uniform heating. Finally, the third step raises the temperature to a high level, facilitating a uniform chemical reaction within the coating film. This innovative approach ensures that the temperature within the substrate's surface is consistent, leading to improved processing outcomes.
Career Highlights
Koichi Asaka is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at this esteemed organization has allowed him to apply his expertise in heat processing technology effectively.
Collaborations
Asaka has collaborated with notable colleagues, including Yuji Matsuyama and Masatoshi Deguchi. Their combined efforts have contributed to advancements in their field and have fostered a collaborative environment for innovation.
Conclusion
Koichi Asaka's contributions to heat processing technology exemplify the impact of innovative thinking in the industry. His patents reflect a commitment to enhancing substrate treatment processes, making him a valuable figure in the realm of inventions.