Kohta Yoshikawa

Title: Kohta Yoshikawa: Semiconductor and Thin-Film Transistor Innovations

Introduction

Kohta Yoshikawa is an inventor associated with Kawasaki, Japan, whose patent work includes semiconductor-device manufacturing and thin-film transistor technologies. He is affiliated with Fujitsu Corporation and is credited with 4 patents.

Latest Patents

“Method of Manufacturing a Semiconductor Device” describes a process for forming and patterning semiconductor, insulating, and conductive films on a substrate. The method uses a resist pattern to shape the conductive film, then uses the patterned film and etch byproducts as masks while processing the insulating film. After removing the byproducts, impurities are implanted into the semiconductor film through exposed portions of the insulating film.

“Thin Film Transistor, Liquid Crystal Display Substrate, and Their Manufacture Methods” describes a transistor structure in which a gate crosses a semiconductor current path in two areas. The design places a lightly doped drain structure beside the channel in one crossing area, while omitting it in the other. The patent presents this arrangement as a way to reduce off-current and ease manufacturing alignment, including for transistors with short gate lengths.

Career Highlights

Yoshikawa’s listed patent work focuses on semiconductor fabrication and transistor structures relevant to electronic devices and liquid crystal display substrates. His affiliation with Fujitsu connects this work to the company’s technology development.

Collaborations

Mitsuru Chida and Michiko Takei are identified as Yoshikawa’s coworkers. The available information does not specify their roles in the patents described here.

Conclusion

Kohta Yoshikawa’s patent portfolio highlights manufacturing methods and thin-film transistor designs aimed at improving semiconductor processing and device performance.