This inventor holds 1 USPTO granted patent. Top assignee: Ebara Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Kohei Ohshima - Innovator in Surface Property Measurement
Introduction
Kohei Ohshima is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of surface property measurement, particularly in polishing processes. His innovative approach has led to the development of a unique system that enhances the efficiency and accuracy of measuring surface properties.
Latest Patents
Ohshima holds a patent for a surface property measuring system, which includes a surface property measuring method, polishing apparatus, and polishing method. This system is designed to accurately measure the surface properties of a polishing pad without causing damage or reducing the throughput of the polishing process. The system features an optical measuring device that directs light to the polishing surface of a rotating polishing pad and measures the surface property based on the reflected light. Additionally, it includes a cover member positioned between the optical measuring device and the polishing pad, along with a transparent-liquid supply line that delivers a transparent liquid onto the polishing pad.
Career Highlights
Kohei Ohshima is associated with Ebara Corporation, a company known for its advanced technology in fluid handling and environmental solutions. His work at Ebara has allowed him to focus on innovations that improve manufacturing processes and product quality.
Collaborations
Ohshima collaborates with Kohei Ota, contributing to advancements in their respective fields. Their partnership exemplifies the importance of teamwork in driving innovation.
Conclusion
Kohei Ohshima's contributions to surface property measurement demonstrate his commitment to innovation and excellence in technology. His patented system represents a significant advancement in the polishing industry, showcasing the potential for improved efficiency and accuracy in manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
