Kohei Doi

Title: Kohei Doi: Innovator in Film Forming Technology

Introduction: Kohei Doi, based in Oshu, Japan, is a notable inventor recognized for his contributions to the field of film forming technology. With a focus on improving methods for depositing materials onto substrates, Doi has secured a patent that demonstrates his ingenuity and expertise.

Latest Patents: Doi holds a patent for a film forming method that involves a sophisticated process of loading a substrate onto a rotary table. This method includes forming an adsorption region for the raw material gas, which is discharged from multiple ports, and setting up a reaction region where a reaction gas is supplied. By separating the atmospheres of these regions using a purge gas, this innovative approach allows for precise control of the film deposition cycle, enhancing efficiency in the production process.

Career Highlights: Doi currently works at Tokyo Electron Limited, a leading company in the semiconductor production equipment industry. His role at this innovative firm allows him to apply his skills in film forming technology, contributing to the advancement of manufacturing processes in the semiconductor field.

Collaborations: Throughout his career, Doi has had the opportunity to collaborate with talented professionals, including Manabu Honma and Yuka Nakasato. These partnerships have fostered a collaborative environment that encourages innovation and the exchange of ideas in their respective projects.

Conclusion: Kohei Doi’s contributions through his patent in film forming technology underscore the importance of innovation in enhancing manufacturing processes. His work at Tokyo Electron Limited, along with collaborations with skilled colleagues, ensures that he remains at the forefront of developments in the semiconductor industry, paving the way for future advancements.