Klaus Schottmann

Title: Klaus Schottmann: Innovator in Semiconductor Technology

Introduction

Klaus Schottmann is a notable inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor technology, particularly with his innovative work on DMOS transistors. His expertise and inventions have had a lasting impact on the industry.

Latest Patents

One of Klaus Schottmann's key patents is titled "DMOS transistor having an increased breakdown voltage and method for production." This invention describes a depletion type DMOS transistor that features a gap in the electrode material, allowing for the incorporation of a well dopant species into the underlying semiconductor material. The design enables a continuous well region with extended lateral extension without increasing depth. The source dopant species is implanted after masking the gap, and additional channel implantation occurs prior to forming the gate dielectric material. This innovative approach enhances the performance and reliability of DMOS transistors.

Career Highlights

Throughout his career, Klaus Schottmann has worked with prominent companies in the semiconductor industry. He has been associated with X-Fab Semiconductor Foundries AG and Texas Instruments Corporation. His work at these organizations has allowed him to develop and refine his inventions, contributing to advancements in semiconductor technology.

Collaborations

Klaus has collaborated with several talented individuals in his field, including Ralf Lerner and Phil Hower. These collaborations have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Klaus Schottmann's contributions to semiconductor technology, particularly through his patent on DMOS transistors, highlight his role as an influential inventor. His work continues to inspire advancements in the industry, showcasing the importance of innovation in technology.