The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2015

Filed:

Feb. 15, 2010
Applicants:

Ralf Lerner, Erfurt, DE;

Phil Hower, Dallas, TX (US);

Gabriel Kittler, Ilmenau, DE;

Klaus Schottmann, Drei Gleichen, DE;

Inventors:

Ralf Lerner, Erfurt, DE;

Phil Hower, Dallas, TX (US);

Gabriel Kittler, Ilmenau, DE;

Klaus Schottmann, Drei Gleichen, DE;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 21/336 (2006.01); H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7828 (2013.01); H01L 29/0623 (2013.01); H01L 29/42376 (2013.01); H01L 29/4238 (2013.01); H01L 29/66666 (2013.01);
Abstract

A depletion type DMOS transistor comprises a gap in electrode material allowing incorporation of a well dopant species into the underlying semiconductor material. During subsequent dopant diffusion a continuous well region is obtained having an extended lateral extension without having an increased depth. The source dopant species is implanted after masking the gap. Additional channel implantation is performed prior to forming the gate dielectric material.


Find Patent Forward Citations

Loading…