Munich, Germany

Klaus Abele

This inventor holds 1 USPTO granted patent. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Abele. Retrieved from https://idiyas.com/inventor/klaus-abele-wkljktm6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Klaus Abele: Innovator in Lithography Systems

Introduction

Klaus Abele is a prominent inventor based in Munich, Germany. He has made significant contributions to the field of lithography systems, particularly in the development of advanced beam-forming and illuminating technologies.

Latest Patents

Klaus Abele holds a patent for a "Beam-forming and illuminating system for a lithography system, lithography system, and method." This innovative system includes an optical element and an adjusting device. The adjusting device is designed to measure a field position and/or a pupil position during the heat-up phase of the system. It adjusts the orientation and/or position of the optical element based on the measured positions to maintain the optical element in a desired position. He has 1 patent to his name.

Career Highlights

Klaus Abele is associated with Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography technology. His work has been instrumental in advancing the capabilities of lithography systems, particularly in the context of EUV lithography.

Collaborations

Some of his notable coworkers include Hubert Holderer and Björn Liebaug, who have collaborated with him on various projects within the company.

Conclusion

Klaus Abele's contributions to lithography systems exemplify the innovative spirit of modern engineering. His work continues to influence the development of advanced optical technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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