Amsterdam, Netherlands

Kjeld Eikema


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight - Kjeld Eikema: Revolutionizing Metrology with Precision Patents

Introduction:

Kjeld Eikema, a brilliant inventor based in Amsterdam, NL, has made significant contributions to the field of metrology with his groundbreaking patent on an inspection apparatus, inspection method, and manufacturing method. His innovative approach to forming metrology targets on a substrate has revolutionized the industry, paving the way for advanced precision measurements.

Latest Patents:

Eikema's most notable patent involves the formation of metrology targets on a substrate using a lithographic process. By illuminating a target comprising grating structures with spatially coherent radiation under different conditions, Eikema has developed a method to capture and analyze interference patterns to calculate asymmetry in the grating. This allows for the measurement of overlay and other performance parameters in the lithographic process.

Career Highlights:

Currently working at ASML Netherlands B.V., a leading company in the field of semiconductor equipment manufacturing, Eikema continues to push the boundaries of metrology technology. His expertise and innovative solutions have positioned him as a key player in the industry, driving advancements in precision measurement techniques.

Collaborations:

Eikema collaborates closely with esteemed colleagues at ASML Netherlands B.V., including Arie Jeffrey Den Boef and Simon Gijsbert Josephus Mathijssen. Together, they form a powerhouse team dedicated to developing cutting-edge metrology solutions that meet the evolving needs of the semiconductor industry.

Conclusion:

In conclusion, Kjeld Eikema's inventive spirit and dedication to precision metrology have placed him at the forefront of innovation in the field. His patented technologies not only showcase his technical prowess but also reflect his commitment to pushing the boundaries of what is possible in the world of semiconductor manufacturing. Eikema's contributions continue to shape the future of metrology, inspiring advancements that drive progress and excellence in the industry.

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