Asml Netherlands B.v.

Kjeld Eikema

Arie Jeffrey Den Boef

Simon Gijsbert Josephus Mathijssen

Nitesh Pandey

Stefan Michiel Witte

Metrology targets are formed on a substrate (W) by a lithographic process. A target (T) comprising one or more grating structures is illuminated with spatially coherent radiation under different conditions. Radiation () diffracted by from said target area interferes with reference radiation () interferes with to form an interference pattern at an image detector (). One or more images of said interference pattern are captured. From the captured image(s) and from knowledge of the reference radiation a complex field of the collected scattered radiation at the detector. A synthetic radiometric image () of radiation diffracted by each grating is calculated from the complex field. From the synthetic radiometric images (') of opposite portions of a diffractions spectrum of the grating, a measure of asymmetry in the grating is obtained. Using suitable targets, overlay and other performance parameters of the lithographic process can be calculated from the measured asymmetry.

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Amsterdam, Netherlands

Kjeld Eikema