Kiyoto Mashima

Title: Kiyoto Mashima: Innovator in X-ray Lithography

Introduction

Kiyoto Mashima is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of optical systems, particularly in X-ray lithography. With a total of 5 patents to his name, Mashima's work has advanced the technology used in various applications.

Latest Patents

One of his latest patents is the "Reflection Reduction Projection Optical System." This innovative system features a large numerical aperture designed for X-ray lithography. It includes at least five aspheric surface reflecting mirrors and a specially configured reflecting mirror. This design allows for reduction imaging on an imaging surface by capturing a light beam from an object in a single pass. The optical system consists of a sequence of mirrors, including a first convex mirror, a first concave mirror, and others, culminating in an aperture stop located on the second convex mirror.

Another notable patent is related to an "Optical Element, Production Method of Optical Element, Optical System." This invention involves an optical element for X-ray reflection, characterized by fine convex or concave surfaces arranged on a substrate. Multilayer films that reflect X-rays are formed over these surfaces. The design ensures that when X-rays enter, they are reflected at a diverging angle, creating multiple secondary X-ray sources on a plane at a specific distance from the surfaces. This innovation enables uniform irradiation of X-rays across a wide area.

Career Highlights

Kiyoto Mashima has worked with notable companies such as Nikon Corporation and Nippon Kogaku K.K. His experience in these organizations has contributed to his expertise in optical systems and X-ray technology.

Collaborations

Throughout his career, Mashima has collaborated with esteemed colleagues, including Takashi Mori and Osamu Tanitsu. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Kiyoto Mashima's contributions to X-ray lithography and optical systems have established him as a key figure in the field. His innovative patents and collaborations reflect his commitment to advancing technology.