Kiyoto Itoh

Title: Kiyoto Itoh: Innovator in Low-Dielectric Constant Film Technology

Introduction

Kiyoto Itoh is a notable inventor based in Tsuruoka, Japan. He has made significant contributions to the field of materials science, particularly in the development of low-dielectric constant films. His innovative approach has led to advancements that are crucial for various electronic applications.

Latest Patents

Kiyoto Itoh holds a patent for a method of stabilizing the quality of low-dielectric constant film. This patent outlines a process that involves placing a substrate between an upper and lower electrode within a reaction chamber. The method includes introducing a silicon-containing hydrocarbon compound source gas, an additive gas, and an inert gas into the space between the electrodes while controlling the gas flow ratio. By generating plasma through RF power application, Itoh's technique allows for the formation of a film with a low dielectric constant at a controlled deposition rate of less than approximately 790 nm/min.

Career Highlights

Kiyoto Itoh is currently employed at Asm Japan K.K., where he continues to work on innovative technologies in the semiconductor industry. His expertise in film formation processes has positioned him as a key player in advancing electronic materials.

Collaborations

Throughout his career, Kiyoto Itoh has collaborated with talented individuals such as Atsuki Fukazawa and Tsunayuki Kimura. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Kiyoto Itoh's contributions to the field of low-dielectric constant films exemplify the impact of innovative thinking in technology. His patent and ongoing work at Asm Japan K.K. highlight his role as a significant inventor in the industry.