Hitachi, Japan

Kiyosi Chiba

This inventor holds 1 USPTO granted patent. Top assignees: Hitachi, Ltd., Service Engineering Co. Ltd.. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kiyosi Chiba. Retrieved from https://idiyas.com/inventor/kiyosi-chiba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 50(Granted Patents)


Company Filing History:


Years Active: 1989

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Kiyosi Chiba: Innovator in Plasma Technology

Introduction

Kiyosi Chiba is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of plasma technology, particularly in the development of apparatuses that utilize plasma for various applications.

Latest Patents

Chiba holds a patent for a Plasma Operation Apparatus. This innovative device utilizes plasma generated by a microwave in conjunction with a magnetic field to perform surface operations on specimens, such as semiconductor substrates. The apparatus is designed for processes like thin film deposition, etching, sputtering, and plasma oxidation. It particularly leverages electron cyclotron resonance, making it suitable for highly efficient and high-quality plasma operations.

Career Highlights

Throughout his career, Kiyosi Chiba has worked with prominent companies, including Hitachi, Ltd. and Service Engineering Co., Ltd. His experience in these organizations has allowed him to refine his expertise in plasma technology and contribute to advancements in the field.

Collaborations

Chiba has collaborated with notable colleagues, including Takuya Fukuda and Yasuhiro Mochizuki. Their combined efforts have furthered the development of innovative technologies in plasma operations.

Conclusion

Kiyosi Chiba's work in plasma technology exemplifies the impact of innovation in the semiconductor industry. His contributions continue to influence advancements in high-quality plasma operations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…