The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 1989
Filed:
Jan. 19, 1988
Takuya Fukuda, Hitachi, JP;
Yasuhiro Mochizuki, Katsuta, JP;
Naohiro Momma, Hitachi, JP;
Shigeru Takahashi, Hitachiota, JP;
Noboru Suzuki, Hitachi, JP;
Tadasi Sonobe, Iwaki, JP;
Kiyosi Chiba, Hitachi, JP;
Kazuo Suzuki, Hitachi, JP;
Hitachi, Ltd., Tokyo, JP;
Service Engineering Co. Ltd., Tokyo, JP;
Abstract
A plasma operation apparatus utilizes plasma generated by a microwave cooperative with a magnetic field as to perform a surface operation on a specimen such as semiconductor substrates, such as, for example, thin film deposition, etching, sputtering and plasma oxidation. The apparatus particularly takes advantage of electron cyclotron resonance and is suitable for performing highly efficient and high-quality plasma operations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile