Osaka, Japan

Kiyoshi Tsunoda

This inventor holds 1 USPTO granted patent. Top assignee: Microwave Chemical Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kiyoshi Tsunoda. Retrieved from https://idiyas.com/inventor/kiyoshi-tsunoda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Kiyoshi Tsunoda - Innovator in (Meth)Acrylic Monomer Production

Introduction

Kiyoshi Tsunoda is an inventor based in Osaka-shi, Osaka, Japan. He has made significant contributions to the field of (meth)acrylic monomer production. His innovative approach aims to enhance the efficiency of the depolymerization process, which is crucial for the development of high-quality acrylic resins.

Latest Patent Applications

Kiyoshi Tsunoda's notable patent application is titled "METHOD FOR PRODUCING (METH)ACRYLIC MONOMER." The purpose of this invention is to provide a method that suppresses heterogeneity in a (meth)acrylic resin depolymerization system. This method facilitates the efficient penetration of microwaves into the system's interior. The process involves three key steps: first, irradiating a prepared (meth)acrylic resin with microwaves to obtain a melt with reduced molecular weight; second, adding additional (meth)acrylic resin to the melt and mixing; and third, irradiating the mixture with microwaves to produce the desired (meth)acrylic monomer. This innovative method addresses the challenges associated with the depolymerization process and enhances the overall efficiency of production.

Conclusion

Kiyoshi Tsunoda's work in the field of (meth)acrylic monomer production showcases his innovative spirit and dedication to improving industrial processes. His contributions are expected to have a lasting impact on the development of acrylic resins.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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