The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
May. 20, 2022
Microwave Chemical Co., Ltd., Osaka, JP;
Tomohisa Yamauchi, Osaka, JP;
Akiyori Hagimoto, Osaka, JP;
Kiyoshi Tsunoda, Osaka, JP;
Yukari Deguchi, Osaka, JP;
Microwave Chemical Co., Ltd., Osaka, JP;
Abstract
The purpose of the present invention is to provide a method for producing a (meth)acrylic monomer that suppresses heterogeneity of a (meth)acrylic resin depolymerization system and that makes it easier for microwaves to reach the system interior efficiently. According to this method for producing a (meth)acrylic monomer, which includes a step 1 for irradiating a prepared (meth)acrylic resin with microwaves and mixing to obtain a melt containing a (meth)acrylic resin having reduced molecular weight, a step 2 for adding additional (meth)acrylic resin to the melt and mixing to obtain a mixture containing additional (meth)acrylic resin in the melt, and a step 3 for irradiating the mixture with microwaves and mixing to obtain a (meth)acrylic monomer, it is possible to suppress heterogeneity of the (meth)acrylic resin depolymerization system and to make it easier for microwaves to reach the system interior efficiently.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile