Kiyomi Imagawa

Title: Kiyomi Imagawa: Innovator in Semiconductor Technology

Introduction

Kiyomi Imagawa is a notable inventor based in Chiba, Japan. She has made significant contributions to the field of semiconductor technology, holding two patents that showcase her innovative approach to manufacturing processes.

Latest Patents

Imagawa's latest patents include a semiconductor substrate manufacturing method and a semiconductor device, along with a method for manufacturing the same. The purpose of her semiconductor substrate manufacturing method is to prevent the detachment of a semiconductor wafer during grinding, as well as to avoid cracking or chipping in the resulting semiconductor substrate. This method involves several steps, including forming a polyimide layer on a support material, affixing the support material to a semiconductor wafer, grinding the wafer, and peeling the support material and polyimide layer from the wafer. The polyimide layer used in this process contains a benzophenone skeleton and an aliphatic structure, with an amine equivalent weight ranging from 4000 to 20000.

Career Highlights

Kiyomi Imagawa is currently employed at Mitsui Chemicals, Inc., where she continues to develop innovative solutions in semiconductor manufacturing. Her work has been instrumental in advancing the efficiency and reliability of semiconductor devices.

Collaborations

Imagawa collaborates with talented colleagues, including Jun Kamada and Kaichiro Haruta, who contribute to her research and development efforts.

Conclusion

Kiyomi Imagawa's contributions to semiconductor technology reflect her dedication to innovation and excellence in her field. Her patents not only address critical challenges in manufacturing but also pave the way for future advancements in semiconductor devices.