Osaka, Japan

Kiyokazu Maruta

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Sumitomo Seika Chemicals Co., Ltd.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kiyokazu Maruta. Retrieved from https://idiyas.com/inventor/kiyokazu-maruta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Kiyokazu Maruta: Innovator in Vacuum Pump Technology

Introduction

Kiyokazu Maruta is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of vacuum pump technology, particularly with his innovative designs that enhance efficiency and functionality.

Latest Patents

Maruta holds a patent for a double vacuum pump apparatus, which includes a gas purification system and an exhaust gas vibration suppressing device. This double vacuum pump apparatus features positive displacement vacuum pumps and is designed with a pressure detector located near the suction port. The system is engineered to connect the discharge port of one vacuum pump to the suction port of another, utilizing a buffer tube and an on-off valve to optimize performance.

Career Highlights

Kiyokazu Maruta is associated with Sumitomo Seika Chemicals Co., Ltd., where he has applied his expertise in vacuum technology. His work has been instrumental in advancing the capabilities of vacuum systems used in various industrial applications.

Collaborations

Maruta has collaborated with notable colleagues, including Kazuo Haruna and Hidenori Kuwata, to further enhance the development of innovative technologies in their field.

Conclusion

Kiyokazu Maruta's contributions to vacuum pump technology exemplify his commitment to innovation and efficiency. His patent and collaborative efforts continue to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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