Kiyohiro Kondow

Title: Kiyohiro Kondow: Innovator in Lithographic Technology

Introduction

Kiyohiro Kondow is a notable inventor based in Annaka, Japan. He has made significant contributions to the field of lithographic technology, holding a total of 9 patents. His work has been instrumental in advancing the capabilities of photosensitive materials used in printing processes.

Latest Patents

Kondow's latest patents include a dry photosensitive lithographic plate comprising a silicon rubber layer. This innovative printing plate features a base, a photosensitive layer formed on the base, and a silicone rubber layer that is created from a silicon rubber composition containing an organopolysiloxane and a reactive aromatic aminosilane compound. Another significant patent is a method for the preparation of an aqueous emulsion of poly(silsesquioxane). This method allows for the creation of a stable aqueous emulsion without the formation of gelled particles, utilizing a trialkoxysilane compound emulsified in an aqueous medium with specific surface active agents.

Career Highlights

Throughout his career, Kiyohiro Kondow has worked with prominent companies such as Shin-Etsu Chemical Co., Ltd. and Fuji Photo Film Company, Limited. His experience in these organizations has contributed to his expertise in the development of innovative materials and processes.

Collaborations

Kondow has collaborated with notable professionals in his field, including Hisashi Aoki and Yasuaki Hara. These collaborations have further enriched his work and led to advancements in lithographic technologies.

Conclusion

Kiyohiro Kondow's contributions to lithographic technology through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to shape the industry and inspire future advancements.