The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 1986
Filed:
Mar. 04, 1985
Hitoshi Fujii, Kasukabe, JP;
Hideo Fujimura, Koshigaya, JP;
Hisashi Aoki, Annaka, JP;
Kiyohiro Kondow, Annaka, JP;
Dai Nippon Insatsu Kabushiki Kaisha, both of, JP;
Shin-Etsu Kagaku Kogyo Kabushiki Kaisha, both of, JP;
Abstract
The present invention relates to an organopolysiloxane material which is cured rapidly by irradiating it with radiation such as ultraviolet rays, electron beam and X-rays to provide a film having good characteristics, which can be readily produced synthetically and which is stable, as well as the material's cured releasing film. The material is obtained by the reaction of (A), an organic silicon compound having a specific formula and having at least one amino group, and (B), an acrylic compound having at least two acrylate groups.