Kiyohiko Mihara

Title: Kiyohiko Mihara: Innovator in Semiconductor Technology

Introduction

Kiyohiko Mihara is a notable inventor based in Itami, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work has implications for the efficiency and effectiveness of semiconductor device preparation.

Latest Patents

Mihara holds a patent for a process for preparing semiconductor devices. This process involves forming an insulation coating, such as low melting point glass, on the surface of a semiconductor substrate. The method includes creating a shaved groove through the insulation coating to reach the inner part of the semiconductor substrate. The insulation coating is designed to crack easily when shaved by a high-speed rotating diamond blade with substantially parallel side surfaces. The innovative aspect of this process is that both the low melting point glass and the semiconductor substrate can be shaved by a diamond blade with a tapered edge, rotating at high speed, without causing cracks in the insulation coating or damaging the semiconductor substrate. This technique allows for the semiconductor substrate to be divided along the shaved groove during the dicing step, resulting in separated semiconductor pellets. Mihara's patent is a testament to his expertise and creativity in semiconductor technology.

Career Highlights

Kiyohiko Mihara is associated with Mitsubishi Denki Kabushiki Kaisha, where he has been able to apply his innovative ideas in a practical setting. His work has contributed to advancements in semiconductor manufacturing processes, enhancing the quality and reliability of semiconductor devices.

Collaborations

Mihara has collaborated with notable colleagues, including Toshiyuki Fujii and Shigeru Hokuyo. These collaborations have likely fostered an environment of innovation and shared expertise, further advancing the field of semiconductor technology.

Conclusion

Kiyohiko Mihara is a distinguished inventor whose contributions to semiconductor technology are noteworthy. His innovative patent demonstrates his commitment to improving manufacturing processes in the industry. His work continues to influence the development of efficient semiconductor devices.