Kimlhiro Higuchi

Title: Kimlhiro Higuchi: Innovator in Plasma Processing Technology

Introduction

Kimlhiro Higuchi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative designs and technologies. His work focuses on enhancing the efficiency and effectiveness of plasma processing apparatuses.

Latest Patents

Higuchi holds a patent for a "Plasma processing apparatus and semiconductor device manufacturing method." This invention includes a processing chamber with a lower electrode made of conductive metal, which serves as a mounting table for a target substrate. The apparatus also features an upper electrode facing the lower electrode and a focus ring surrounding the target substrate. An electrical connection mechanism is integrated to connect the base of the lower electrode to the focus ring, generating a DC current based on the potential difference.

Career Highlights

Higuchi is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His work has been instrumental in advancing plasma processing technologies, which are crucial for the production of semiconductor devices.

Collaborations

Higuchi has collaborated with notable colleagues, including Takashi Yamamoto and Shunsuke Mizukami. Their combined expertise has contributed to the development of innovative solutions in the semiconductor field.

Conclusion

Kimlhiro Higuchi's contributions to plasma processing technology have made a significant impact on the semiconductor industry. His innovative patent and collaborations with esteemed colleagues highlight his role as a key inventor in this field.