Company Filing History:
Years Active: 1999-2000
Title: Kimiyasu Sano: Innovator in Photoresist Technology
Introduction
Kimiyasu Sano is a prominent inventor based in Tsukuba, Japan. He has made significant contributions to the field of photoresist technology, holding a total of 3 patents. His work focuses on developing innovative materials that enhance the performance of electronic components.
Latest Patents
One of his latest patents is a negative photoresist stripping liquid composition. This composition comprises from 30 to 75% by weight of dimethyl sulfoxide, from 20 to 65% by weight of 1,3-dimethyl-2-imidazolidinone, from 0.1 to 5% by weight of a tetraalkylammonium hydroxide, and from 0.5 to 15% by weight of water. The composition exhibits superior stripping performance, particularly against alkali-developable photoresists that can form films of at least 20 µm in thickness. It also remains stable and does not freeze when stored outdoors in winter conditions. This composition is particularly useful for the stripping of negative photoresists used in bump formation and for fabricating circuit substrates.
Another notable patent is a radiation-sensitive resin composition, which is essential for various applications in the electronics industry.
Career Highlights
Kimiyasu Sano is associated with JSR Corporation, a leading company in the development of advanced materials. His work has significantly impacted the field of semiconductor manufacturing and electronic component fabrication.
Collaborations
He has collaborated with notable colleagues, including Toshiyuki Ota and Hozumi Sato, contributing to advancements in their shared field of expertise.
Conclusion
Kimiyasu Sano's innovative work in photoresist technology continues to influence the electronics industry. His patents reflect a commitment to enhancing material performance and reliability in semiconductor applications.