Kim Sunmi

Title: Innovations of Kim Sunmi in Silicon Wafer Production

Introduction

Kim Sunmi is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the production of silicon wafers. His innovative methods have the potential to enhance the quality and yield of semiconductor devices.

Latest Patents

Kim Sunmi holds a patent for a "Silicon wafer and method for producing silicon single crystal." This patent describes a method for growing a silicon single crystal ingot using the Czochralski method. The technique aims to provide silicon wafers with very uniform in-plane quality, which is crucial for improving the yield of semiconductor devices. The method involves dividing the convection of a silicon melt into a core cell and an outer cell, ensuring that the maximal horizontal direction width of the core cell is between 30 to 60% of the surface radius of the silicon melt. Additionally, the method specifies that the maximal vertical direction depth of the core cell should be equal to or more than 50% of the maximal depth of the silicon melt.

Career Highlights

Kim Sunmi is currently employed at Siltron, Inc., where he continues to develop innovative solutions in semiconductor manufacturing. His work has been instrumental in advancing the technology used in producing high-quality silicon wafers.

Collaborations

Some of his notable coworkers include Hyon-Jong Cho and Cheol-Woo Lee, who have collaborated with him on various projects related to semiconductor technology.

Conclusion

Kim Sunmi's contributions to the field of silicon wafer production exemplify the importance of innovation in semiconductor technology. His patented methods not only improve the quality of silicon wafers but also enhance the overall yield of semiconductor devices.