Singapore, Singapore

Kim Seong Sim

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kim Seong Sim. Retrieved from https://idiyas.com/inventor/kim-seong-sim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Kim Seong Sim and Semiconductor Chamber Cleaning Innovation.

Introduction

Kim Seong Sim is an inventor associated with Applied Materials, Inc. His patent work concerns systems and methods for cleaning components used in semiconductor process chambers.

Latest Patents

The provided information lists one patent for Kim Seong Sim: “System and Method of Cleaning Process Chamber Components.” The invention describes a process chamber with a substrate support and a gas distribution assembly, along with a gas baffle connected to the assembly. A sensor system monitors at least one characteristic of the chamber volume, while a dynamic gas assist is connected to the gas baffle and communicates with the sensor. These elements support a controlled approach to cleaning semiconductor process chamber components. The supplied data reports 1 patent.

Career Highlights

Kim Seong Sim’s listed patent reflects work in semiconductor manufacturing technology, particularly equipment and processes for maintaining process chamber components. The information provided identifies Applied Materials, Inc. as his company.

Collaborations

The supplied information names Won Ho Sung and Roman M. Mostovoy as coworkers. Their specific roles in the patent or related work are not provided.

Conclusion

Kim Seong Sim’s listed invention focuses on sensor-informed gas assistance for cleaning semiconductor process chamber components, highlighting a practical contribution to semiconductor equipment technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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