Applied Materials, Inc.

Kim Seong Sim

Roman M Mostovoy

Won Ho Sung

Jong Yun Kim

Pei-Chia Chen

Embodiments described herein relate to process systems for cleaning semiconductor process chamber components. The process systems include a process chamber having process chamber components. The process chamber components include a substrate support disposed within a chamber volume of the process chamber. A gas distribution assembly faces the substrate support. A gas baffle is fluidly coupled to the gas distribution assembly. A sensor system is coupled to the process chamber and is configured to monitor at least one characteristic of the volume of the process chamber. A dynamic gas assist is fluidly coupled to the gas baffle and is communicatively coupled to the sensor.

Growing community of inventors

Singapore, Singapore

Kim Seong Sim