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Years Active: 2014
Title: Kim Nam Sung: Innovator in CMOS Transistor Technology
Introduction
Kim Nam Sung is a notable inventor based in Beacon, NY, with a significant contribution to the field of semiconductor technology. His innovative work, especially in the fabrication of CMOS (Complementary Metal-Oxide-Semiconductor) transistors, showcases the advancements that can be achieved through targeted methodologies and treatments.
Latest Patents
Kim holds a patent for the "Methods of forming CMOS transistors using tensile stress layers and hydrogen plasma treatment." This invention focuses on methods for creating integrated circuit devices. Specifically, it details the process of forming a PMOS transistor featuring a silicon-germanium (SiGe) channel region, which is then subjected to hydrogen plasma exposure. This method not only enhances the performance of the transistors but also introduces the formation of a tensile stress layer, optimizing the source and drain regions through hydrogen plasma treatment.
Career Highlights
Throughout his career, Kim Nam Sung has been affiliated with leading technology companies, notably Samsung Electronics Co., Ltd. and International Business Machines Corporation (IBM). His work in these companies has significantly contributed to advancements in semiconductor technology and integrated circuit design, making him a recognized figure in the industry.
Collaborations
In his professional journey, Kim has collaborated with distinguished coworkers, including Yong-Kuk Jeong and Laegu Kang. Their collective expertise and synergy have played a pivotal role in advancing innovative methodologies within the semiconductor sector.
Conclusion
Kim Nam Sung’s contributions to CMOS transistor technology underline the importance of innovation in improving electronic devices. His patent reflects a significant step forward in semiconductor manufacturing, demonstrating the crucial role inventors play in shaping the future of technology. As he continues to push the boundaries of what is possible in this field, Kim's work remains a testament to the power of innovation and collaboration in driving progress.