Kilho Lee

Title: Kilho Lee: Innovator in Semiconductor Technology

Introduction

Kilho Lee is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on improving the efficiency and functionality of CMOS semiconductor structures.

Latest Patents

One of Kilho Lee's latest patents is titled "Formation of dual work function gate electrode." This patent describes a method for creating a dual work function gate electrode in a CMOS semiconductor structure. The method ensures that there is no boron penetration in the channel region and no boron depletion near the gate oxide. The process involves several steps, including the formation of a gate oxide layer, the use of an undoped polysilicon layer, and specific ion implantation techniques to achieve the desired results. Another significant patent is the "Dual gate oxide process without critical resist and without N2 implant." This process allows for the provision of gate oxide areas on a substrate with varying thicknesses without the need for a nitrogen implantation process.

Career Highlights

Kilho Lee has worked with prominent companies in the semiconductor industry, including Infineon Technologies AG. His experience in these organizations has contributed to his expertise in semiconductor innovations and patent development.

Collaborations

Kilho Lee has collaborated with notable professionals in his field, including Helmut Horst Tews and Ravikumar Ramachandran. These collaborations have likely enhanced his research and development efforts in semiconductor technology.

Conclusion

Kilho Lee is a distinguished inventor whose work in semiconductor technology has led to valuable patents and advancements in the field. His contributions continue to influence the development of efficient semiconductor structures.