Suwon, South Korea

Kil-Ho Ok

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2012.


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Kil-Ho Ok: Innovator in Virtual Measurement Technology

Introduction

Kil-Ho Ok is a prominent inventor based in Suwon, South Korea. He is known for his contributions to the field of virtual measurement technology, particularly in the area of deposition thickness measurement for amorphous silicon.

Latest Patents

Kil-Ho Ok holds a patent for a "Virtual measuring device and method." This invention provides a method for measuring the deposition thickness of amorphous silicon on a substrate. The method involves predicting and adapting operations to enhance measurement accuracy. During the deposition process, the thickness is predicted by multiplying a predicted deposition speed by the deposition time, utilizing a prediction model that correlates various process factors with the deposition speed. The predicted thickness is then compared with the actual measured thickness, allowing for adjustments in the prediction model based on the comparison results.

Career Highlights

Kil-Ho Ok is currently employed at Samsung Display Co., Ltd., where he applies his expertise in innovative measurement technologies. His work has significantly contributed to advancements in the display industry, particularly in improving the efficiency and accuracy of manufacturing processes.

Collaborations

Kil-Ho Ok has collaborated with notable colleagues, including Joo-Hwa Lee and Won-Hyouk Jang. Their combined efforts have fostered innovation and development in their respective fields.

Conclusion

Kil-Ho Ok's work in virtual measurement technology exemplifies the impact of innovative thinking in the manufacturing sector. His contributions continue to shape advancements in the industry, demonstrating the importance of precision in technological development.

Profile summary based on public USPTO records.
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