This inventor holds 2 USPTO granted patents and 3 published patent applications and 2 EPO patents. Top assignee: Kanto Kagaku Kabushiki Kaisha. Active years: 2016-2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Soka, JP (2016)
- Saitama, JP (2022)
Company Filing History:
Years Active: 2016-2022
Title: Kikue Morita: Innovator in Cleaning Liquid Compositions
Introduction
Kikue Morita is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of cleaning liquid compositions, particularly in the context of electronic device production. With a total of 2 patents, Morita's work focuses on enhancing the cleaning processes for semiconductor substrates.
Latest Patents
Morita's latest patents include a cleaning liquid composition designed for substrates subjected to chemical mechanical polishing (CMP) processes. This innovative cleaning solution is particularly effective for substrates with copper wiring, comprising one or more basic compounds and nitrogen-containing monocyclic heterocyclic aromatic compounds. The composition maintains a hydrogen ion concentration (pH) of 8-12, ensuring optimal cleaning without damaging the substrate.
Another significant patent by Morita is a cleaning liquid composition specifically aimed at removing metallic impurities and particulates from semiconductor substrates. This formulation contains basic compounds free of metals and phosphonic acid-based chelating agents, with a pH range of 8 to 10. This ensures that the cleaning process does not cause corrosion of copper wiring, making it ideal for semiconductor device production.
Career Highlights
Kikue Morita is associated with Kanto Kagaku Kabushiki Kaisha, where he continues to innovate in the field of cleaning solutions for electronic devices. His expertise in developing effective cleaning compositions has positioned him as a key figure in the industry.
Collaborations
Morita has collaborated with notable colleagues, including Takuo Ohwada and Yumiko Taniguchi, who contribute to the research and development of advanced cleaning solutions.
Conclusion
Kikue Morita's contributions to cleaning liquid compositions have significantly impacted the semiconductor manufacturing process. His innovative patents reflect a commitment to improving cleaning efficiency while ensuring the integrity of electronic components.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile