Hwaseong-si, South Korea

Kicheon Byun

This inventor holds 1 USPTO granted patent. Top assignees: Ltc., Ltd, Samsung Display Co., Ltd., T.e.s., Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kicheon Byun. Retrieved from https://idiyas.com/inventor/kicheon-byun-p5itrbgl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Kicheon Byun: Innovator in Display Technology

Introduction

Kicheon Byun is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent.

Latest Patents

Kicheon Byun holds a patent for a "Method of manufacturing display apparatus." This method involves several key steps, including forming a semiconductor layer on a substrate, creating an insulating layer on the semiconductor layer, and etching the insulating layer to form a contact hole that exposes part of the semiconductor layer. Additionally, the process includes a primary cleaning of the insulating layer using a cleaning gas that contains both fluorine and hydrogen gases. This patent showcases his expertise in enhancing display manufacturing processes.

Career Highlights

Throughout his career, Kicheon Byun has worked with prominent companies in the technology sector. He has been associated with Samsung Display Co., Ltd., a leader in display technology, and T.E.S., Inc., where he has further honed his skills and contributed to various projects.

Collaborations

Kicheon Byun has collaborated with talented individuals in his field, including Gugrae Jo and Hyoungsik Kim. These collaborations have likely enriched his work and led to advancements in display technology.

Conclusion

Kicheon Byun is a distinguished inventor whose work in display technology has made a lasting impact. His innovative methods and collaborations reflect his commitment to advancing the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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