Fremont, CA, United States of America

Kibyung Seong

This inventor holds 1 USPTO granted patent. Top assignee: Kla Tencor Corporation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kibyung Seong. Retrieved from https://idiyas.com/inventor/kibyung-seong-3ad5d2ap

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Kibyung Seong: Innovator in Wafer Measurement Technology

Introduction

Kibyung Seong is a notable inventor based in Fremont, California. He has made significant contributions to the field of wafer measurement technology. His innovative approach addresses critical challenges in the semiconductor industry.

Latest Patents

Kibyung Seong holds a patent for a method aimed at compensating for wafer shape measurement variation due to environmental temperature changes. This patent, titled "Method for compensating for wafer shape measurement variation due to variation of environment temperature," focuses on reducing measurement errors without the need to measure the wafer temperature or the surrounding air's temperature gradient.

Career Highlights

Kibyung Seong is currently employed at KLA Corporation, a leading company in the semiconductor industry. His work at KLA involves developing advanced technologies that enhance the accuracy of wafer measurements. His expertise has been instrumental in improving the reliability of semiconductor manufacturing processes.

Collaborations

Kibyung has collaborated with Shouhong Tang, a fellow innovator in the field. Their partnership has contributed to advancements in measurement technologies, further solidifying their impact on the industry.

Conclusion

Kibyung Seong's innovative work in wafer measurement technology exemplifies the importance of addressing environmental factors in semiconductor manufacturing. His contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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