Gyeonggi-do, South Korea

Kibeom Lee

This inventor holds 1 USPTO granted patent. Top assignee: Lg Display Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kibeom Lee. Retrieved from https://idiyas.com/inventor/kibeom-lee-m6rn4hjb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Kibeom Lee: Innovator in Ink Composition and Pattern Formation

Introduction

Kibeom Lee is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of ink composition and pattern formation, particularly in the context of imprint lithography and roll-printing technologies.

Latest Patents

Kibeom Lee holds a patent for an innovative ink composition and method of forming a pattern using the same. This patent addresses the challenges associated with imprint lithography and roll-printing by providing an ink composition that minimizes swelling phenomena. The invention enhances the accuracy of pattern formation and improves the yield and efficiency of the process by increasing the transfer rate of patterns.

Career Highlights

Kibeom Lee is currently employed at LG Display Co., Ltd., where he continues to develop cutting-edge technologies in display and semiconductor manufacturing. His work has been instrumental in advancing the capabilities of ink compositions used in various applications.

Collaborations

Kibeom Lee collaborates with talented individuals such as Jinwuk Kim and Byonghoo Kim, contributing to a dynamic team focused on innovation and excellence in their field.

Conclusion

Kibeom Lee's contributions to ink composition and pattern formation demonstrate his commitment to innovation in technology. His work not only enhances manufacturing processes but also paves the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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