The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2013
Filed:
Dec. 12, 2008
Jinwuk Kim, Gyeonggi-do, KR;
Kibeom Lee, Gyeonggi-do, KR;
Byonghoo Kim, Gyeonggi-do, KR;
Seunghyup Shin, Seoul, KR;
Junyong Song, Gyeonggi-do, KR;
Myoungsoo Lee, Seoul, KR;
Jinwuk Kim, Gyeonggi-do, KR;
Kibeom Lee, Gyeonggi-do, KR;
Byonghoo Kim, Gyeonggi-do, KR;
Seunghyup Shin, Seoul, KR;
Junyong Song, Gyeonggi-do, KR;
Myoungsoo Lee, Seoul, KR;
LG Display Co., Ltd., Seoul, KR;
Abstract
There are provided an ink composition for imprint lithography and roll-printing, which is applied to the formation of a pattern using imprint lithography and roll-printing to play the role of a pattern support, can increase the accuracy of pattern formation by minimizing the occurrence of a swelling phenomenon caused by the ink composition, and can improve yield and the efficiency of the process by increasing the transfer rate of a pattern, and a method of forming a pattern of a display or semiconductor by using the same.