Ki-young Kwon

Title: Ki-young Kwon: Innovator in Photosensitive Polymers

Introduction

Ki-young Kwon is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of materials science, particularly in the development of photosensitive polymers. With a total of 4 patents to his name, Kwon's work has garnered attention for its innovative applications in various industries.

Latest Patents

One of Kwon's latest patents involves a photosensitive polymer that maintains transparency even when exposed to a short-wavelength light source of 193 nm or below. This polymer exhibits improved adhesiveness to substrates, enhanced contrast, and superior resistance to dry etching. The formulation includes a first monomer that is an alicyclic hydrocarbon carboxylate with an acid-labile C to C tertiary alicyclic hydrocarbon group as a substituent, along with a second monomer capable of free radical polymerization.

Career Highlights

Throughout his career, Ki-young Kwon has worked with leading companies in the technology sector, including Samsung Electronics Co., Ltd. and Hynix Semiconductor Inc. His experience in these organizations has allowed him to refine his expertise in polymer science and contribute to cutting-edge research and development.

Collaborations

Kwon has collaborated with notable colleagues such as Hyun-woo Kim and Dong-won Jung. These partnerships have facilitated the exchange of ideas and fostered innovation in their respective fields.

Conclusion

Ki-young Kwon's contributions to the development of photosensitive polymers highlight his role as a key innovator in materials science. His patents reflect a commitment to advancing technology and improving industrial applications.