The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2003
Filed:
Aug. 23, 2000
Applicant:
Inventors:
Sook Lee, Seoul, KR;
Ki-young Kwon, Seoul, KR;
Si-hyeung Lee, Suwon, KR;
Kwang-sub Yoon, Seoul, KR;
Hyun-woo Kim, Seonganm, KR;
Dong-won Jung, Yongin, KR;
Sang-jun Choi, Seoul, KR;
Sang-gyun Woo, Suwon, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 1/000 ;
U.S. Cl.
CPC ...
C08F 1/000 ;
Abstract
A photosensitive polymer which maintains transparency even when exposed to a short-wavelength light source of 193 nm or below, exhibits improved adhesiveness to a substrate, improved contrast and improved resistance to dry etching. The photosensitive polymer includes a first monomer which is alicyclic hydrocarbon carboxylate having an acid-labile C to C tertiary alicyclic hydrocarbon group as a substituent, and a second monomer which is capable of free radical polymerization.