Ki Sik Im

Title: Ki Sik Im: Innovator in Power Devices and Image Sensors

Introduction

Ki Sik Im is a notable inventor based in Daegu, South Korea. He has made significant contributions to the fields of power devices and image sensors. With a total of 2 patents, his work reflects a commitment to advancing technology in these areas.

Latest Patents

One of Ki Sik Im's latest patents is a method of manufacturing a power device. This method includes forming a first drift region on a substrate, followed by patterning to create a trench. A second drift region is then formed by growing n-gallium nitride (GaN) within the trench, alternating with the first drift region. The process culminates in the formation of a source electrode contact layer, along with source and gate electrodes, and a drain electrode positioned on the opposite side of the substrate from the first drift region.

Another significant patent is related to an image sensor and the method for manufacturing it. This method involves forming a pixel array that includes a photodiode structure and an insulating film structure within an active area of a semiconductor substrate. It also includes the formation of a metal pad on the insulating film structure, followed by a dielectric and/or etch stop film. A protective layer is then added, and pad and pixel openings are created by etching the protective layer.

Career Highlights

Ki Sik Im has worked with prominent companies in the technology sector, including Samsung Electronics Co., Ltd. and Dongbu Hitek Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative technologies.

Collaborations

Throughout his career, Ki Sik Im has collaborated with talented individuals such as Jae Hoon Lee and Ki Se Kim. These partnerships have likely enhanced his work and led to further advancements in his field.

Conclusion

Ki Sik Im is a distinguished inventor whose contributions to power devices and image sensors have made a significant impact in the technology industry. His innovative methods and collaborations reflect his dedication to advancing technological solutions.