This inventor holds 3 USPTO granted patents. Top assignees: Industry-University Cooperation Foundation Sogang University, Hanwha Chemical Corporation. Active years: 2003-2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2003-2013
Title: Innovations by Ki Pung Yoo
Introduction
Ki Pung Yoo is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of cleaning technology, particularly through his innovative patents. With a total of 3 patents, Yoo has focused on simplifying cleaning processes and enhancing their effectiveness.
Latest Patents
Yoo's latest patents include a cleaning apparatus and a high-pressure cleaner designed for use therein. The cleaning apparatus aims to simplify the cleaning process, reduce the time required for cleaning, and achieve an excellent cleaning effect. The cleaning process involves loading a wafer into a high-pressure cleaner, injecting high-purity gaseous carbon dioxide (CO) at low pressure, and utilizing a supercritical homogeneous transparent phase mixture for cleaning. This innovative approach not only streamlines the cleaning process but also ensures a thorough rinse by separating CO from the discharged mixture.
Career Highlights
Throughout his career, Ki Pung Yoo has worked with various organizations, including the Industry-University Cooperation Foundation at Sogang University and Hanwha Chemical Corporation. His experience in these institutions has contributed to his expertise in developing advanced cleaning technologies.
Collaborations
Yoo has collaborated with notable coworkers such as Jong Sung Lim and Gap Su Han. Their combined efforts have furthered the development of innovative cleaning solutions.
Conclusion
Ki Pung Yoo's contributions to cleaning technology through his patents demonstrate his commitment to innovation and efficiency. His work continues to impact the industry positively, showcasing the importance of advancements in cleaning processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile