The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2011
Filed:
Aug. 04, 2006
Gap Su Han, Yongin, KR;
Ki Pung Yoo, Seoul, KR;
Jong Sung Lim, Seoul, KR;
Young Hoon Kwon, Seoul, KR;
Gap Su Han, Yongin, KR;
Ki Pung Yoo, Seoul, KR;
Jong Sung Lim, Seoul, KR;
Young Hoon Kwon, Seoul, KR;
Abstract
Provided is a cleaning process which is simplified and in which a time required for the cleaning process is reduced and which has an excellent cleaning effect. The cleaning process comprises loading a wafer in a high pressure cleaner, injecting high-purity gaseous carbon dioxide (CO) having low pressure into the high pressure cleaner, injecting COhaving lower pressure than supercritical cleaning pressure into the high pressure cleaner, cleaning the wafer by injecting a supercritical homogeneous transparent phase mixture in which a cleaning additive and supercritical COare mixed, into the high pressure cleaner under a supercritical cleaning pressure, rinsing the wafer by injecting a supercritical rinsing mixture in which a rinsing additive and supercritical COare mixed, into the high pressure cleaner, and separating COfrom a mixture discharged from the high pressure cleaner.