Ki-Ok Kwon

Title: Ki-Ok Kwon: Innovator in Photosensitive Organic Anti-Reflective Layers

Introduction

Ki-Ok Kwon is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of materials science, particularly in the development of compositions for photosensitive organic anti-reflective layers. His innovative work has implications for various applications in the electronics industry.

Latest Patents

Ki-Ok Kwon holds a patent titled "Composition for forming a photosensitive organic anti-reflective layer and method of forming a pattern using the same." This patent includes a composition that consists of about 0.5 to about 5 percent by weight of an acid-labile thermal cross-linking agent, approximately 10 to about 22 percent by weight of a copolymer resin containing anthracene, and a photo-acid generator, among other components. This invention aims to enhance the efficiency and effectiveness of pattern formation in electronic devices.

Career Highlights

Throughout his career, Ki-Ok Kwon has worked with prominent organizations, including Samsung Electronics Co., Ltd. and Seoul National University. His experience in these institutions has allowed him to collaborate with leading experts in the field and contribute to groundbreaking research and development.

Collaborations

Some of Ki-Ok Kwon's notable coworkers include Sang-Woong Yoon and Jong-Chan Lee. Their collaborative efforts have further advanced the research in materials science and technology.

Conclusion

Ki-Ok Kwon's contributions to the field of photosensitive organic anti-reflective layers demonstrate his innovative spirit and commitment to advancing technology. His work continues to influence the electronics industry and inspire future research.