The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2010

Filed:

Nov. 16, 2006
Applicants:

Sang-woong Yoon, Seoul, KR;

Jong-chan Lee, Seoul, KR;

Ki-ok Kwon, Seoul, KR;

Sang-ho Cha, Seoul, KR;

Geun Huh, Seoul, KR;

Inventors:

Sang-Woong Yoon, Seoul, KR;

Jong-Chan Lee, Seoul, KR;

Ki-Ok Kwon, Seoul, KR;

Sang-Ho Cha, Seoul, KR;

Geun Huh, Seoul, KR;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/039 (2006.01); H01L 21/30 (2006.01); C08F 220/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A composition for forming a photosensitive organic anti-reflective layer includes about 0.5 to about 5 percent by weight of an acid-labile thermal cross-linking agent that is decomposed by an epoxy group and a photo-acid generator, about 10 to about 22 percent by weight of a copolymer resin that includes an acrylate monomer containing anthracene or a methacrylate monomer containing anthracene, about 0.1 to about 1 percent by weight of a photo-acid generator, and a solvent.


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