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Years Active: 2010
Title: Geun Huh: Innovator in Photosensitive Organic Anti-Reflective Layers
Introduction
Geun Huh is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of materials science, particularly in the development of compositions for photosensitive organic anti-reflective layers. His innovative work has implications for various applications in the electronics industry.
Latest Patents
Geun Huh holds a patent titled "Composition for forming a photosensitive organic anti-reflective layer and method of forming a pattern using the same." This patent includes a composition that consists of about 0.5 to about 5 percent by weight of an acid-labile thermal cross-linking agent, about 10 to about 22 percent by weight of a copolymer resin containing anthracene, and a photo-acid generator, among other components. This invention is crucial for enhancing the performance of photolithography processes.
Career Highlights
Throughout his career, Geun Huh has worked with prominent organizations such as Samsung Electronics Co., Ltd. and Seoul National University. His experience in these institutions has allowed him to collaborate with leading experts in the field and contribute to groundbreaking research.
Collaborations
Geun Huh has collaborated with notable colleagues, including Sang-Woong Yoon and Jong-Chan Lee. These partnerships have fostered innovation and have been instrumental in advancing research in materials science.
Conclusion
Geun Huh's contributions to the field of photosensitive organic anti-reflective layers demonstrate his commitment to innovation and excellence. His work continues to influence the electronics industry and paves the way for future advancements.