Ki-Ho Yang

Title: Innovations by Ki-Ho Yang

Introduction

Ki-Ho Yang is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his expertise and innovative spirit. His work primarily focuses on methods that enhance the design and manufacturing processes in the semiconductor industry.

Latest Patents

One of Ki-Ho Yang's latest patents is a method of designing a mask. This method involves creating a first mask that includes an active region, a gate structure, and a gate tap that partially overlaps with both the active region and the gate structure. The first mask is modified to extend a portion of the gate tap, followed by an optical proximity correction (OPC) process to design a second mask. Another significant patent is a method of calculating a shift value of a cell contact. In this method, a reference region and a correction region are established on an image of an actual cell block, which contains multiple actual cell contacts formed using a mask. The preliminary shift values of these actual cell contacts are measured against target cell contacts in a target cell block. The method aims to minimize the preliminary shift values in the reference region and accurately calculate the actual shift values in the correction region, allowing for precise mask corrections.

Career Highlights

Ki-Ho Yang is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has allowed him to contribute to cutting-edge technologies and innovations that drive the industry forward.

Collaborations

Some of Ki-Ho Yang's coworkers include Sibo Cai and Seung-Hune Yang. Their collaboration in various projects has likely contributed to the successful development of innovative solutions in semiconductor technology.

Conclusion

Ki-Ho Yang's contributions to the semiconductor industry through his patents and work at Samsung Electronics Co., Ltd. highlight his role as an influential inventor. His innovative methods for mask design and cell contact calculations are paving the way for advancements in semiconductor manufacturing.