Location History:
- Carrieres sur Seine, FR (2011 - 2013)
- Montbonnot Saint Martin, FR (2015)
Company Filing History:
Years Active: 2011-2015
Title: Khalid Radouane: Innovator in Silicon Technologies
Introduction
Khalid Radouane is a notable inventor based in Carrieres sur Seine, France. He has made significant contributions to the field of silicon technologies, holding a total of 4 patents. His work focuses on methods that enhance the performance and quality of silicon substrates.
Latest Patents
One of Khalid Radouane's latest patents is a method to thin a silicon-on-insulator substrate. This innovative method involves conducting a thermal oxidation treatment of the initial substrate to oxidize part of the silicon surface layer. It also includes a first cycle of etching followed by cleaning to fully remove the thermal oxide and lift off unstable parts of the substrate. The process continues with a second cycle of etching to remove polluting particles, resulting in a final silicon-on-insulator substrate with a thinned surface layer that serves as an active layer.
Another significant patent is a process for preparing cleaned surfaces of strained silicon. This method treats wafers that comprise a surface layer of silicon-germanium and a layer of strained silicon in contact with it. The invention aims to achieve a surface layer of strained silicon with minimal defects, enhancing the quality of the wafers.
Career Highlights
Khalid Radouane has worked with prominent companies in the silicon industry, including Soitec and S.O.I.TEC Silicon on Insulator Technologies. His experience in these organizations has allowed him to develop and refine his innovative techniques in silicon processing.
Collaborations
Throughout his career, Khalid has collaborated with talented individuals such as Alessandro Baldaro and Cecile Aulnette. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Khalid Radouane is a distinguished inventor whose work in silicon technologies has led to valuable innovations. His patents reflect a commitment to improving silicon substrates, which are essential in various electronic applications.